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عنوان
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Investigation of annealing effects on optical properties of Ti thin films deposited by RF magnetron sputtering
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نوع پژوهش
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مقاله چاپشده در مجلات علمی
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کلیدواژهها
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RF magnetron sputtering, TiO2 thin films, Annealing effect, Optical properties, Optical band gap
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چکیده
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Titanium oxide thin films were synthesized through thermal oxidation of sputter deposited titanium layers on glass substrates. Transmittance spectra of UV–vis analysis were utilized to calculate thickness, refrac- tive index and extinction coefficient of the oxidized layers by using Swanepoel method. Optical parameters like: optical band gap energy, conductivity, dielectric constants εr, εi and dissipation factor were also determined. AFM imaging of the as sputtered thin films showed that with increasing deposition time, surface roughness increases. Optical measurements indicate that transmittance decreases with increasing sputtering time in visible and infrared spectral range.
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پژوهشگران
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کتایون غلامی (نفر دوم)، داوود مهرپرور (نفر پنجم)، رستم مرادیان (نفر چهارم)، بندر آستین چپ (نفر سوم)، ایرج منوچهری (نفر اول)
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