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Title
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Investigation of annealing effects on optical properties of Ti thin films deposited by RF magnetron sputtering
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Type
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JournalPaper
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Keywords
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RF magnetron sputtering, TiO2 thin films, Annealing effect, Optical properties, Optical band gap
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Abstract
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Titanium oxide thin films were synthesized through thermal oxidation of sputter deposited titanium layers on glass substrates. Transmittance spectra of UV–vis analysis were utilized to calculate thickness, refrac- tive index and extinction coefficient of the oxidized layers by using Swanepoel method. Optical parameters like: optical band gap energy, conductivity, dielectric constants εr, εi and dissipation factor were also determined. AFM imaging of the as sputtered thin films showed that with increasing deposition time, surface roughness increases. Optical measurements indicate that transmittance decreases with increasing sputtering time in visible and infrared spectral range.
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Researchers
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Katauon Gholami (Second Researcher), Dawood mehrparvar (Fifth Researcher), Rostam Moradian (Fourth Researcher), Bandar Astinchap (Third Researcher), Iraj Manuchehri (First Researcher)
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