This study investigates the surface morphology of titanium thin films deposited on glass substrates using RF-sputtering at varying sputtering powers (500, 550, and 600 W). The films’ surface characteristics were analyzed through atomic force microscopy and multifractal analysis. Results indicate that titanium thin films exhibit multifractal behavior, with increased sputtering power leading to more pronounced multifractality. Higher sputtering powers also resulted in rougher and more heterogeneous surfaces, as revealed by surface roughness measurements and fractal dimension analysis. The study highlights the impact of sputtering power on surface complexity, isotropy, and overall surface activity, emphasizing the importance of these parameters in enhancing the functional properties of titanium thin films. Accurately controlling and measuring these properties are necessary for designing and optimizing thin film materials.
